PROCEEDINGS VOLUME 8819
SPIE NANOSCIENCE + ENGINEERING | 25-29 AUGUST 2013
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
Proceedings Volume 8819 is from: Logo
SPIE NANOSCIENCE + ENGINEERING
25-29 August 2013
San Diego, California, United States
Front Matter: Volume 8819
Proc. SPIE 8819, Front Matter: Volume 8819, 881901 (25 September 2013); doi: 10.1117/12.2033971
Nanomanufacturing Metrology
Proc. SPIE 8819, Controlling high-throughput manufacturing at the nano-scale, 881902 (20 September 2013); doi: 10.1117/12.2026714
Proc. SPIE 8819, Inkjet printing of carrier transport layers for inverted organic solar cells, 881903 (20 September 2013); doi: 10.1117/12.2024787
Proc. SPIE 8819, Detection limits for nanoparticles in solution with classical turbidity spectra, 881905 (20 September 2013); doi: 10.1117/12.2021643
Metrology Instrumentation I
Proc. SPIE 8819, New generation CMOS 2D imager evaluation and qualification for semiconductor inspection applications, 881907 (20 September 2013); doi: 10.1117/12.2026963
Proc. SPIE 8819, Illumination design for semiconductor backlight inspection and application extensions, 881908 (20 September 2013); doi: 10.1117/12.2026967
Proc. SPIE 8819, 6-DOF displacement and angle measurements using heterodyne laser encoder, 881909 (20 September 2013); doi: 10.1117/12.2024082
Metrology Instrumentation II
Proc. SPIE 8819, NSF nanomanufacturing program and its implications for measurement and control, 88190A (20 September 2013); doi: 10.1117/12.2033963
Proc. SPIE 8819, Nanomanufacturing concerns about measurements made in the SEM I: imaging and its measurement, 88190B (20 September 2013); doi: 10.1117/12.2025578
Proc. SPIE 8819, Advance in dimensional measurements of nano-objects based on defocusing of the electron probe of a scanning electron microscope, 88190D (20 September 2013); doi: 10.1117/12.2023056
Metrology Instrumentation III
Proc. SPIE 8819, Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties, 88190E (23 September 2013); doi: 10.1117/12.2027259
Proc. SPIE 8819, Nanomanufacturing concerns about measurements made in the SEM II: specimen contamination, 88190F (20 September 2013); doi: 10.1117/12.2027060
Proc. SPIE 8819, Pulse-to-pulse stability analysis in a frequency-doubled, q-switched Nd:YAG rod-laser, 88190G (20 September 2013); doi: 10.1117/12.2025847
Poster Session
Proc. SPIE 8819, Study of ion beam damage in magnetic tunnel junction on FIB prepared samples, 88190I (20 September 2013); doi: 10.1117/12.2026767
Proc. SPIE 8819, Development of the size calibration SOP for SEM measurement, 88190J (20 September 2013); doi: 10.1117/12.2022991
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