Accuracy in integrated circuit dimensional measurements

James Potzick

doi:10.1117/12.187463

1 July 1994 Accuracy in integrated circuit dimensional measurements

James Potzick

Proceedings Volume 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review; 1027409 (1994) https://doi.org/10.1117/12.187463
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The calibration of the standard and the conditions necessary for a valid comparison are discussed. The principles discussed here apply to many other types of measurement as well.

Citation Download Citation

James Potzick "Accuracy in integrated circuit dimensional measurements", Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027409 (1 July 1994); https://doi.org/10.1117/12.187463

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