Software for analysis of the process of formation of the catalytic mask in the off-electrode plasma

M. A. Markushin; V. A. Kolpakov; S. V. Krichevskiy

doi:10.1117/12.2270743

6 April 2017 Software for analysis of the process of formation of the catalytic mask in the off-electrode plasma

M. A. Markushin, V. A. Kolpakov, S. V. Krichevskiy

Proceedings Volume 10342, Optical Technologies for Telecommunications 2016; 1034215 (2017) https://doi.org/10.1117/12.2270743
Event: XIV International Scientific and Technical Conference on Optical Technologies in Telecommunications, 2016, Samara, Russian Federation

Abstract

We investigated one of the technologies of forming microrelief of diffractive optical elements. The technology is based on using catalytic mask in off-electrode plasma. We have developed a software that allows to evaluate some important parameters of this technological process. First, it is the evaluation of numerical values of concentration profiles "vacancies" and semiconductor atoms in the melt. Second, it is the evaluation of time for irradiation the "metal - semiconductor" structure to achieve the desired depth and the doping concentration of the semiconductor atoms in the melt layer. This enabled to determine the best modes for generating a predetermined height of diffractive microrelief.

Citation Download Citation

M. A. Markushin, V. A. Kolpakov, and S. V. Krichevskiy "Software for analysis of the process of formation of the catalytic mask in the off-electrode plasma", Proc. SPIE 10342, Optical Technologies for Telecommunications 2016, 1034215 (6 April 2017); https://doi.org/10.1117/12.2270743

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