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21 September 2017 Study of thin film oxidation kinetics using a combination of simulations and advanced characterization (Conference Presentation)
Juan Jose Díaz León, David M. Fryaud, Nobuhiko P. Kobayashi
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Proceedings Volume 10349, Low-Dimensional Materials and Devices 2017; 1034910 (2017) https://doi.org/10.1117/12.2274809
Event: SPIE Nanoscience + Engineering, 2017, San Diego, California, United States
Abstract
Understanding thin film oxidation is fundamental from a scientific point of view. There are many processes that benefit from oxidation, such as passivation or memristor formation. On the other hand, oxidation can be a burden, such as in metallic interconnects. Oxidation thermodynamics have been studied for a long time; however, oxidation kinetics in different time scales, oxidation environments and temperatures have yet to be fully understood. In this work we use a combination of simulations and nanoscale characterization to further investigate and understand oxidation kinetics. Results include self-aligned electroforming of selector/memristor structures and ways to control copper oxide formation.
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Juan Jose Díaz León, David M. Fryaud, and Nobuhiko P. Kobayashi "Study of thin film oxidation kinetics using a combination of simulations and advanced characterization (Conference Presentation)", Proc. SPIE 10349, Low-Dimensional Materials and Devices 2017, 1034910 (21 September 2017); https://doi.org/10.1117/12.2274809
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KEYWORDS
Thin films
Electron microscopy
Ellipsometry
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