Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

Ivo W. Rangelow; Claudia Lenk; Martin Hofmann; Tzvetan Ivanov; Steve Lenk; Elshad Guliyev; Marcus Kaestner; Cemal Aydogan; Mahmut Bicer; B. Erdem Alaca; Onur Ates; Hamdi Torun; Arda D. Yalcinkaya; Ahmad Ahmad; Alexander Reum; Mathias Holz

doi:10.1117/12.2282606

31 January 2018 Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

Ivo W. Rangelow, Claudia Lenk , Martin Hofmann , Tzvetan Ivanov, Steve Lenk, Elshad Guliyev, Marcus Kaestner, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda D. Yalcinkaya, Ahmad Ahmad, Alexander Reum, Mathias Holz

Author Affiliations +

Proceedings Volume 10456, Nanophotonics Australasia 2017; 1045621 (2018) https://doi.org/10.1117/12.2282606
Event: SPIE Nanophotonics Australasia, 2017, Melbourne, Australia

Abstract

Next-generation electronic and optical devices demand high-resolution patterning techniques and high-throughput fabrication. Thereby Field-Emission Scanning Probe Lithography (FE-SPL) is a direct writing method that provides high resolution, excellent overlay alignment accuracy and high fidelity nanopatterns. As a demonstration of the patterning technology, single-electron transistors as well as split ring electromagnetic resonators are fabricated through a combination of FE-SPL and plasma etching at cryogenic temperatures.

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Ivo W. Rangelow, Claudia Lenk , Martin Hofmann , Tzvetan Ivanov, Steve Lenk, Elshad Guliyev, Marcus Kaestner, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda D. Yalcinkaya, Ahmad Ahmad, Alexander Reum, and Mathias Holz "Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices", Proc. SPIE 10456, Nanophotonics Australasia 2017, 1045621 (31 January 2018); https://doi.org/10.1117/12.2282606

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