UV Surface Photochemistry And Hot Electron Transfer

James P Cowin; Eugene P Marsh; Wolfgang Meier; Terry L. Gilton; Mark R. Schneider

doi:10.1117/12.951628

15 August 1989 UV Surface Photochemistry And Hot Electron Transfer

James P Cowin, Eugene P Marsh, Wolfgang Meier, Terry L. Gilton, Mark R. Schneider

Proceedings Volume 1056, Photochemistry in Thin Films; (1989) https://doi.org/10.1117/12.951628
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

Two different photolytic mechanisms were identified for CH3C1 on Ni(111). Direct photolysis and electron-induced fragmentation was observed in time of flight (TOF) studies using 193 nm radiation. At 248 nm only the electron induced channel was observed. Both mechanisms were strongly inhibited in the first 2 monolayers, due to electron transfer occurring on a 1 to 5 femtosecond time scale. The electron induced process was surface specific, occurring within a limited adsorbate thickness determined by the penetration depth of the excited substrate electrons into the adsorbate. Cross sections for the total photolytic removal of parent molecules are reported as a function of coverage.

Citation Download Citation

James P Cowin, Eugene P Marsh, Wolfgang Meier, Terry L. Gilton, and Mark R. Schneider "UV Surface Photochemistry And Hot Electron Transfer", Proc. SPIE 1056, Photochemistry in Thin Films, (15 August 1989); https://doi.org/10.1117/12.951628

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