In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiation

Y. Minami; S. Takahashi; H. Minami; Y. Matsumoto; M. Kadoi; A. Sekiguchi; T. Watanabe

doi:10.1117/12.2503255

3 October 2018 In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiation

Y. Minami, S. Takahashi, H. Minami, Y. Matsumoto, M. Kadoi, A. Sekiguchi, T. Watanabe

Author Affiliations +

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108091W (2018) https://doi.org/10.1117/12.2503255
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

In this study, we prepared the EUV metal resist, which included ZrO₂ nano-particle and three type of ligands such as 2-propenoic acid 2-methyl (MAA), propanoic acid 2-methyl (IBA) and vinylbenzoic acid (VBA). In this study, we prepared the following resists by blending each material separately for evaluating the outgassing from the view point of EUV resist materials. We prepared three type of samples on a basis of ZrO₂-MAA, ZrO₂-IBA and ZrO₂-VBA, each resist was coated on a silicon wafer, and we evaluated the outgassing from these samples during irradiation of 2 keV electron by in-situ mass spectrometry. From the results of mass spectrum, we observed the outgassing of PAG as unique peaks. And each ligand peak was distributed over the low mass range. On the other hand, the ZrO₂ peaks could not be observe in mass spectrum of each sample. Thus, ZrO₂ nano-particles might not be evaporating during 2keV electron irradiation.

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Y. Minami, S. Takahashi, H. Minami, Y. Matsumoto, M. Kadoi, A. Sekiguchi, and T. Watanabe "In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiation", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091W (3 October 2018); https://doi.org/10.1117/12.2503255

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