High-precision MoSi multilayer coatings at high-volume for continued EUVL infrastructure development

Michael Kriese; Yang Li; Jeffery Steele; Yuriy Platonov

doi:10.1117/12.2514989

26 March 2019 High-precision MoSi multilayer coatings at high-volume for continued EUVL infrastructure development

Michael Kriese, Yang Li, Jeffery Steele, Yuriy Platonov

Proceedings Volume 10957, Extreme Ultraviolet (EUV) Lithography X; 109571I (2019) https://doi.org/10.1117/12.2514989
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

The development of industrial infrastructure for EUV lithography requires a wide array of optics beyond the mask and the scanner optics, which include optics for critical instruments such as actinic inspection optics or in-situ diffusers. This paper will detail recent results in the production of high-precision multilayer coatings achieved to support this development. In the first case, a range of imaging optics with multiple sizes and radial designs are all produced in a cyclic fashion on a single high-volume machine. Optics feature a diameter from a few millimeters to over 200mm, as well as a range of curvatures, on high-capacity machine in which four different optics were efficiently calibrated and coated in parallel. Details relating to results of precision, repeatability, and added surface distortion are highlighted. In the second case, the contribution to developing a diffusing multilayer by using sputter deposition to first create a tuned irregular surface is described. This diffusive EUV surface is a critical component for an in-situ EUV scanner wavefront metrology system based on lateral shearing interferometry. Details will be shared on the use of Cr as a thin film that can be deposited to meet process requirements for the tuned parameters of surface roughness required to reduce the reflective specular component and the spatial frequency spectrum of the roughness to fully fill the pupil without excessive overfill leading to loss of light.

Citation Download Citation

Michael Kriese, Yang Li, Jeffery Steele, and Yuriy Platonov "High-precision MoSi multilayer coatings at high-volume for continued EUVL infrastructure development", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109571I (26 March 2019); https://doi.org/10.1117/12.2514989

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Multilayers

Extreme ultraviolet

Reflectivity

Extreme ultraviolet lithography

Chromium

Scattering

EUV optics

Show All Keywords

Keywords/Phrases

Search In:

Publication Years