MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)

Christof Klein; Hans Loeschner; Elmar Platzgummer

doi:10.1117/12.2516033

2 December 2019 MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)

Christof Klein, Hans Loeschner, Elmar Platzgummer

Author Affiliations +

Proceedings Volume 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019; 109580K (2019) https://doi.org/10.1117/12.2516033
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Publisher’s Note: This video, originally published on 16 August 2019, was withdrawn per author request.

Citation Download Citation

Christof Klein, Hans Loeschner, and Elmar Platzgummer "MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)", Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580K (2 December 2019); https://doi.org/10.1117/12.2516033

Access the abstract

PROCEEDINGS
1 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Microopto electromechanical systems

Optical lithography

Semiconductors

Video

RELATED CONTENT

A novel method to quantify the complex mask patterns
Proceedings of SPIE (March 08 2016)

Projection Photolithography Of Large CCD Arrays
Proceedings of SPIE (August 08 1977)

Image Formation In Thick Resist
Proceedings of SPIE (July 17 1979)

Managing high-accuracy and fast convergence in OPC
Proceedings of SPIE (October 20 2006)

Critical Dimension Measurement In The Scanning Electron Microscope
Proceedings of SPIE (October 15 1984)

Pattern Recognition Automatic Fine Alignment
Proceedings of SPIE (September 13 1982)

Subscribe to Digital Library

Receive Erratum Email Alert

Keywords/Phrases

Search In:

Publication Years