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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Metrology, Inspection, and Process Control for Microlithography XXXIII, edited by Vladimir A. Ukraintsev, Ofer Adan, Proceedings of SPIE Vol. 10959 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510625655 ISBN: 9781510625662 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2019, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/19/$18.00. Printed in the United States of America by Curran Associates, Inc., under license from SPIE. Publication of record for individual papers is online in the SPIE Digital Library.
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AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Adiga, Umesh, 0I, 24 Adolf, A., 31 Aerts, Silvia, 2V Ahmad, Ahmad, 29 Alkoken, R., 2S Amit, Eran, 1E Anberg, Doug, 1I Ando, Satoshi, 08 Arjavac, Jason, 24 Atkins, Phillip R., 21 Avedisian, Brett, 0I Bahrenberg, Lukas, 1X Barla, Kathy, 0C, 1C Barnes, Bryan M., 0Z Bar-On, T., 2S Bellah, Md. Motasim, 06, 28 BenDavid, Nir, 06, 28 Bérard-Bergery, Sébastien, 0Y Besacier, Maxime, 0U, 0Y Beylier, Charlotte, 1M Bhattacharyya, Kaustuve, 02, 1G Biedrzycki, Mark, 0I Birnstein, Norman, 2O Bizen, Daisuke, 1D Blancquaert, Yoann, 0U Bonam, Ravi, 10 Borisov, Sergei, 1Z Boullart, Werner, 0C, 1C Bouyssou, Regis, 1M Bozkurt, Murat, 1G Brose, Sascha, 1X Brouzet, V., 2Q Buhl, Stefan, 2F Bunday, Benjamin D., 1Z Burger, Sven, 11 Byun, Jin-Moo, 2M Canga, Eren, 2K Chagoya-Garzon, Alexandre, 1M Chang, Hsien-Hung, 21 Chang, Jan-Hau, 21 Chang, Ken, 1G Chang, Nick Weihan, 21 Charley, Anne-Laure, 0F, 1N, 1O Chen, Aiden, 1R Chen, Kai-Hsiung, 1G Chen, Xiaomei, 2A Cheng, Zh. H., 22 Chiu, Afu, 2P Chiu, Chu-Han, 21 Choi, Ahlin, 1E, 2F Choi, Byoung-Il, 13 Choi, DongSub, 1E Choi, Jaeseung, 13 Chou, Kevin, 1R Chu, Hsiao Lun, 2P Clarke, James, 0I Cohen, Avi, 2K Constantoudis, Vassilios, 1F, 20, 2Z Cramer, Jillian, 0C Cross, Andrew, 1V Danylyuk, Serhiy, 1X Das, Sayantan, 0F, 0H Decaunes, J., 1Q Decoster, Stefan, 0Q Demirer, Onur, 05 den Boef, Arie, 1G Deng, Shaoren, 1N, 1O Desmoulins, S., 1A Dezauzier, Christophe, 1M Diebold, Alain C., 0X Dillen, Harm, 2W Diller, Timothy, 2N Dmitriev, Vladimir, 2K Dohi, H., 22 Dong, Lisong, 2X Dou, Shuyang, 2G Dror, Chen, 06, 28 Ducoté, J., 1M Duvdevani-Bar, S., 2S Eberle, A. L., 31 Ebert, Martin, 1R Eller, Michael J., 0O Enomoto, Masashi, 2N Erley, Georg, 1P Fang, Wei, 23, 2W Feng, Mu, 13 Fillinger, Laurent, 0M Foltynski, Bartosz, 2M Frachel, Michael, 1P Freitag, Martin, 2T Fritz, H., 31 Frommhold, Andreas, 0T Gao, Kun, 06, 28 Gao, Linfei, 06 Gao, Xindong, 06, 28 Gardin, Christian, 1A, 1M Ger, Avron, 0F, 1N Gergaud, Patrice, 0U Gershtein, L., 2S Ghafoori, Moein, 1X Giannatou, Eva, 20 Glabisch, Sven, 1X Gogolides, Evangelos, 1F, 20, 2Z Golotsvan, Anna, 1E Gonda, Satoshi, 2B Goosen, Maikel, 2W Gorhad, Kujan, 2K Gosali, Benny, 1G Goto, Yasunori, 15 Gottipati, Abhishek, 06, 28 Gourgon, Cécile, 0Y Gredy, V., 2Q Groeger, Philip, 1P, 2F Gronheid, Roel, 05 Grouwstra, Cedric, 2M Grzela, Grzegorz, 2M Gu, Yajun, 1I Guhlemann, Steffen, 2F, 2O Guliyev, Elshad, 29 Gutjahr, Karsten, 06, 28 Ha, Hyeon-Jun, 2M Habets, Boris, 1P, 2O, 2P, 2T Hagen, C. W., 0V Hagger, Jack, 24 Hajaj, Eitan, 1E, 28 Hajiahmadi, Reza, 1G Hakala, Chris, 1C Halder, Sandip, 0F, 0H, 1V Hamaguchi, Akira, 1B Hammerschmidt, Martin, 11 Han, Sang-Jun, 07, 1E Han, Woojun, 2I Hand, Sean, 1L Hao, Xueli, 06, 28 Hashizume, Tomihiro, 1Y Hasibi, Faegheh, 1H Hayashi, S., 22 Hazart, Jérôme, 0Y Henn, Mark-Alexander, 0Z Hermans, Jan, 1I Herrera, Pedro, 06, 28 Herzel, Eitan, 1E Higashibata, Satomi, 05 Hirai, Akiko, 2B Hirose, K., 22 Holz, Mathias, 29 Hong, Minhyung, 1E Horikawa, I., 2S Hou, Xisen, 0O Hou, Zhenyu, 13 Hsu, Hsiao-Lin, 2P, 2T Hu, Kwang-Young, 2M Hu, Xuerang, 1R Huang, Foster, 2P Huang, Guo-Tsai, 1G Huang, Shang-Chieh, 0D Huisman, Thomas J., 2W Hung, Joey, 0F, 1N Hunsche, S., 1A Hwang, Jong-Hyun, 2M Ida, Chihiro, 1B Iida, Susumu, 0J Ikota, Masami, 0Q, 1Y Illiberi, Andrea, 1N, 1O Ishikawa, Jun, 08 Ishikawa, Masayoshi, 12, 2G Ivanov, Tzvetan, 29 Izawa, Masayuki, 12, 2G Jang, Won-Jae, 2M Javaheri, Narjes, 1G Jeon, Sanghuck, 1E Jeon, Se-Ra, 2M Jeong, Junhee, 2L Ji, Rongyi, 2A Johanesen, Hayley, 0C, 1C Joo, K.-N., 27 Joung, Tony, 06, 28 Kai, Ding, 2O Kal, Subhadeep, 0X Kämmer, N., 31 Kang, Daekwon, 13 Karssenberg, Jaap, 07 Karvtsov, Angela, 1L Kaufmann, N., 31 Kawada, Hiroki, 0Q Kazumi, H., 22 Keller, Nick, 0X Kenslea, Anne, 0C, 1C Kern, Robert, 2N Kessar, M., 2Q Keyvani, S., 2E Kiers, T., 1A Kim, Cheolkyun, 13 Kim, Gilbert, 13 Kim, Hwi, 2L Kim, Jaisoon, 2I Kim, Jang-Sun, 2M Kim, Jun-Yeob, 07 Kim, Mingyu, 2F Kim, Seop, 2F Kim, Wan-Soo, 2F Kim, Young-Seok, 13 Kizu, Ryosuke, 2B Klebanov, G., 2S Klein, Dana, 1E Ko, Sung-woo, 13 Kobayashi, Shinji, 2N Kontoyiannis, Ioannis, 2Z Korde, Madhulika, 0X Koret, Roy, 0F, 1N Kris, R., 2S Krishnan, Shankar, 21 Kruit, P., 0V Kuiper, S., 2E Kwakman, Laurens, 0C, 1C Lam, Auguste, 1H Lamonds, Lucas, 1P Lancee, Remco, 2M Lang, Jun, 13 Lariviere, Stephane, 1V Larrañaga, Maialen, 1H Lazzarino, Frederic, 0Q, 1O Le Cunff, D., 2Q Lecarpentier, L., 1Q Ledoux, Micah, 0I Lee, Brian, 23 Lee, Dohwa, 1E Lee, Dong-Hak, 07 Lee, Dong-Young, 07, 1E, 2F Lee, Hong-Goo, 07, 1E, 2F Lee, Ho-Se, 29 Lee, Jeongpyo, 1E Lee, JeonKyu, 13 Lee, Jieun, 1E Lee, Julie, 30 Lee, Jun Ho, 2L Lee, Jungtae, 1E Lee, Liequan, 21 Lee, SeIl, 13 Lee, Seongjae, 1E Lee, Yungi, 2I Le-Gratiet, B., 1A, 1M, 1Q, 2Q Lemaire, P., 2Q Leray, Philippe, 05, 0F, 0H, 1N, 1O, 1V, 2K, 2W Levi, Shimon, 1L Levy, S., 2S Li, Guannan, 2A Li, Mingqi, 0O Li, Waikin, 05 Li, Weihua, 06, 28 Lin, John, 1G Lin, Yung-Hsiang, 21 Liu, Lituo, 2A Liu, Meng, 13 Liu, Rex H., 2O, 2P, 2T Liu, Xuedong, 1R Liu, Zephyr, 1E Lomtscher, Patrick, 2O, 2P, 2T Loosen, Peter, 1X Lorusso, Gian Francesco, 0P, 0Q, 0T, 20 Lung, Hsiang-Lan, 1J Ma, Eric, 1R Ma, Ling, 2X Maas, Ruben, 2W Maassen, Martijn, 1R Macht, Lukasz, 2M Mack, Chris A., 0P, 1Z Maes, Jan Willem, 1N, 1O Mani, Antonio, 1V Mao, Ming, 05 Marciano, Tal, 1E Marcuccilli, Gino, 30 Maruyama, Kotaro, 0D, 0H Mathew, B., 2S Mathijssen, Simon, 1G Matsubara, Shinichi, 1Y McDaniel, Tony, 2N Mei, Hao, 06, 1E, 28 Mermet, O., 1A Mertens, Hans, 0C, 1C Michels, Robert, 1X Midoh, Yoshihiro, 0B Mileham, Jeffrey, 1I Mili, A., 1Q Milléquant, Matthieu, 1M Milo, Renan, 06, 28 Miroku, H., 2S Misumi, Ichiko, 2B Mizutani, Shinji, 0H Mizutani, Shunsuke, 1D Momonoi, Yoshinori, 14, 1D Morita, Masahiro, 08 Mosden, Aelan, 0X Moussa, Alain, 1N, 1O Muehle, Alexander, 1P, 2O Muelders, Thomas, 1L Müller, I., 31 Nagai, Satoshi, 05 Nagai, Takamitsu, 0J Nagayoshi, Hiroyuki, 08 Naipak, Victoria, 06, 28 Nakamae, Koji, 0B Nelson, Dan, 24 Neyezhmakov, Pavel, 2Y Nguyen, Duy Duc, 18 Ninomiya, Taku, 15 Nishihata, Takahiro, 1B Noifeld, E., 2S Nooitgedagt, Tjitte, 07 Noot, Marc, 1G, 2M Novak, O., 2S Oberai, Assad A., 10 Oh, Hangyeong, 2I Oh, Nang-Lyeom, 07 Ohta, Hiroya, 15 Orf, Bryan, 1P Osaki, Mayuka, 1B Osborne, Jason, 1L Ostrovsky, Alain, 1M Otten, Ronald, 1I Ouchi, Masanori, 2G Owen, David, 1I Pai, Shyh-Shii, 21 Paolillo, Sara, 1O Papagrorgiou, Harria, 20 Papavieros, George, 1F, 20, 2Z Park, Chan-Ha, 07, 13, 1E, 2F Park, Chris, 2L Park, DeNeil, 06, 28 Park, Jongcheon, 13 Park, Shin-Woong, 2L Pastol, Anne, 1H Pastur, S., 2S Patel, Dhruv, 10 Patterson, Oliver D., 1R Pereira, Cheryl, 0X Peters, J., 2E Petroni, Paolo, 1M Prentice, C., 1A Prokopov, Alexander, 2Y Pu, Lingling, 23, 2W Qin, Nan, 2N Ramanathan, Vidya, 06, 28 Rangelow, Ivo W., 29 Rathore, D., 2S Reay, Thomas, 2N Reche, Jérôme, 0U Ren, Alex, 2O Ren, Weiming, 1R Reum, Alexander, 29 Reuter, Christoph, 29 Riedesel, C., 31 Rispens, Gijsbert, 0T Robinson, John C., 1E Roller, Justin, 24 Rue, Chad, 0I Rutigliani, Vito, 0T, 20 Sadeghian, Hamed, 0M Sah, Kaushik, 1V Saib, Mohamed, 0F, 1N, 1O Sakakibara, Makoto, 1D Sakimura, Shigetoshi, 12, 2G Saltoun, Lilach, 1E Salvador, Dave, 30 Sato, Yoshishige, 0D Saville, Barry, 30 Sawamura, Junpei, 08 Schelcher, Guillaume, 0F Schiavone, Patrick, 18, 1M Schiffelers, Guido, 0T Schneider, Philipp-Immanuel, 11 Schwarzband, Ishai, 1L, 2S Schweikert, Emile A., 0O Sendelbach, Matthew, 0F Serwy, Roger, 2N Setoguchi, Katsumi, 14 Shahrjerdy, Mir, 07 Shiba, Yuji, 08 Shibazaki, Yuichi, 08 Shichi, Hiroyasu, 1Y Shimoda, Ryo, 0H Shimura, Satoru, 2N Shindo, Hiroyuki, 12, 2G Shinoda, Shinichi, 12, 2G Siew, Yong Kong, 0C, 1C Silver, Richard M., 0Z Sim, Hakyong, 13 Simmons, Mark, 13 Singh, Amandev, 1I Singh, Subodh, 1I Sinitsina, Vera, 1Z Skliarov, Vladimir, 2U, 2Y Soco, Aileen, 07 Sohda, Yasunari, 15 Sommer, E., 2S Son, Hyung-Sub, 2M Song, Sonyong, 08 Stock, Hans-Jurgen, 1L Stollenwerk, Jochen, 1X Strauss, Michael, 0C, 1C, 1N, 24 Su, Eason, 1G Sufrin, Yael, 2K Sun, Wei, 15 Sungauer, Elodie, 0Y Suzuki, Makoto, 14, 1D Suzuki, Masaru, 05 Suzuki, Yusaku, 1B Takahashi, Satoru, 0Q Takamasu, Kiyoshi, 0Q Tanaka, Maki, 1B Tanaka, Sayuri, 08 Tanaka, Yusuke, 05 Tang, P., 1A Tanimoto, Sayaka, 1Y Tel, W., 1A Thrun, Xaver, 1P Tien, D., 1A Tilson, Ashley, 24, 2V Tobayas, Matan, 1L Tolle, Ian, 30 Tortai, Jean-Herve, 18 Tottewitz, Steven, 2P, 2T Toyoda, Yasutaka, 12, 2G Trefonas, Peter, 0O Tsai, Li-Shiuan, 21 Tseng, Sheng-Yang, 21 Turovets, Igor, 0F, 1N Uchiyama, Takayuki, 0J Valade, Charles, 0Y Van den Heuvel, Dieter, 05, 1V van der Meijden, Vidar, 2M van Dijk, Leon, 1H, 1I van Es, Maarten H., 0M van Haren, Richard, 1H, 1I van Kessel, L., 0V van Leest, Arno, 07 Van Roey, Frieda, 0P, 0T, 20 Verkhoturov, Stanislav V., 0O Volfman, Alon Alexander, 28 Volkovich, Roie, 1E Wang, Cathy, 1G Wang, F., 1A Wang, Fei, 1R Wang, Lei, 13 Wang, Meng, 06, 28 Wang, Teng, 23, 2W Wang, Y., 1A Wang, Zhigang, 14 Warrick, Scott, 2C Wei, Yayi, 2X Weintraub, Jeffrey, 2C Willekers, R., 2E Witvoet, G., 2E Wong, Cheuk Wun, 06, 28 Woodworth, Gabriel, 1N Wu, Chun-Sheng, 21 Xu, Buqing, 2X Xu, Ming, 23 Yahiro, Takehisa, 08 Yamaguchi, Satoru, 14 Yamamoto, Takuma, 1B Yamazaki, Yuichiro, 0D, 0H Yang, Cheng Hao, 2T Yang, Dongyue, 06, 28 Yaziv, Tal, 06, 28 Yen, Chi-Fu, 21 Yin, Weihua, 1R Yohanan, Raviv, 28 Yong, Poh-Boon, 30 Yoo, Gyun, 13 You, Byeong Geon, 2L Yu, Chun Chi, 2T Yu, Xiaoya, 2A Yumiba, Ryo, 12, 2G Yun, Y. H., 27 Zagaris, Antonios, 1G Zeidler, D., 31 Zhao, Nan, 23 Zhao, Qian, 13 Zhao, Yiqiong, 13 Zheng, Yunan, 13 Zhou, Hui, 0Z Zhou, Wayne, 1E Zhou, Weihu, 2A Zhou, Wentian, 23 Zhou, Yue, 06, 28 Zou, Xiongfeng, 2X Zschiedrich, Lin, 11 Conference CommitteeSymposium Chair Symposium Co-chair Conference Chair Conference Co-chair Conference Program Committee
Session Chairs
IntroductionThe Metrology, Inspection, and Process Control for Microlithography XXXIII conference started with metrology challenges of state of the art silicon based quantum devices. While quantum devices are all about entanglement, quantum was not the only entanglement in the conference. Edge Placement Error (EPE) metrology approaches were presented to address the entanglement between metrology and inspection, and within metrology the entanglement of CD uniformity, roughness, 3D, pattern placement, and overlay errors. Various approaches were presented; from an all in one solution to a heterogeneous fleets of different perspectives of metrology and inspection to novel technologies, fused by artificial intelligence. Artificial intelligence was also studied from the metrological challenges raised by the new devices enabling it. CPU’s, GPU’s, and TPU’s and future solutions all reviewed in invited tutorials you can read about in these Proceedings. As technology nodes shrink and structures become more complex, many novel technologies were introduced, and workhorse ones were improved. Hopefully these Proceedings become a reference and foundation for future work. This comes with a bigger hope that the readers come back, and submit a paper telling others of novel achievements, and sharing interesting results of scientific merit to keep fueling the conference audience interest. Dear readers, Looking forward to seeing your submissions, presented next year on the podium, or interacting with the audience next to your poster. Thank you. Vladimir A. Ukraintsev Ofer Adan |
