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26 March 2019 Variable-wavelength tabletop-scale EUV ptychographic complex imaging reflectometry for 3D composition determination (Conference Presentation)
Michael Tanksalvala, Christina L. Porter, Yuka Esashi, Galen P. Miley, Robert Karl Jr., Peter Johnsen, Nicholas W. Jenkins, Charles S Bevis, Bin Wang, Jeremy Thurston, Xiaoshi Zhang, Seth L. Cousin, Daniel E. Adams, Michael Gerrity, Henry C. Kapteyn, Margaret Murnane.
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Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 109590G (2019) https://doi.org/10.1117/12.2516827
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States
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Michael Tanksalvala, Christina L. Porter, Yuka Esashi, Galen P. Miley, Robert Karl Jr., Peter Johnsen, Nicholas W. Jenkins, Charles S Bevis, Bin Wang, Jeremy Thurston, Xiaoshi Zhang, Seth L. Cousin, Daniel E. Adams, Michael Gerrity, Henry C. Kapteyn, and Margaret Murnane. "Variable-wavelength tabletop-scale EUV ptychographic complex imaging reflectometry for 3D composition determination (Conference Presentation)", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590G (26 March 2019); https://doi.org/10.1117/12.2516827
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KEYWORDS
3D image processing
Extreme ultraviolet
Reflectometry
Stereoscopy
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