Advances in metal oxide resist performance and production (Conference Presentation)

Jason K. Stowers; Peter de Schepper; Michael Kocsis; Andrew Grenville

doi:10.1117/12.2515099

25 March 2019 Advances in metal oxide resist performance and production (Conference Presentation)

Jason K. Stowers, Peter de Schepper, Michael Kocsis, Andrew Grenville

Proceedings Volume 10960, Advances in Patterning Materials and Processes XXXVI; 1096016 (2019) https://doi.org/10.1117/12.2515099
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Inpria is a leader in the development of high-performance photoresist materials for EUV lithography. By design, these photoresists enable patterning at extremely small pitches, exhibit high EUV absorption to reduce the photon shot noise otherwise amplified in conventional resists, and provide high etch selectivity to provide a large process window. Such characteristics derive from the metal oxide molecular cluster composition of the resists and the small, highly homogeneous building blocks this chemistry enables. We will present recent advances to Inpria photoresist platforms which have resulted in improved RLS performance, process stability, and photospeed tunability. We demonstrate the patterning capabilities for specific use cases in logic and memory applications, including the performance after etch. For patterning on an NXE:3300, the materials deliver large process windows both for line/space features at 26nm pitch needed for logic metal patterning and for the 43nm pitch hex pillar arrays required for DRAM applications. Pilot-scale batches of Inpria’s resists are routinely produced on our production line. We will review our manufacturing facility and the capabilities of our formulation process scaled to support the production requirements of leading device manufacturers.

Conference Presentation

Citation Download Citation

Jason K. Stowers, Peter de Schepper, Michael Kocsis, and Andrew Grenville "Advances in metal oxide resist performance and production (Conference Presentation)", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096016 (25 March 2019); https://doi.org/10.1117/12.2515099

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KEYWORDS

Metals

Oxides

Optical lithography

Photoresist materials

Etching

Extreme ultraviolet lithography

Logic

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