EUV reticle inspection using phase retrieval algorithms: a performance comparison

Ricarda Nebling; Iacopo Mochi; Dimitrios Kazazis; Uldis Locans; Atoosa Dejkameh; Yasin Ekinci

doi:10.1117/12.2536936

29 September 2019 EUV reticle inspection using phase retrieval algorithms: a performance comparison

Ricarda Nebling, Iacopo Mochi, Dimitrios Kazazis, Uldis Locans, Atoosa Dejkameh, Yasin Ekinci

Proceedings Volume 11147, International Conference on Extreme Ultraviolet Lithography 2019; 111470R (2019) https://doi.org/10.1117/12.2536936
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

RESCAN is an actinic patterned EUV mask metrology tool based on coherent diffraction imaging. An image of the reticle is reconstructed from recorded diffraction patterns using a phase retrieval algorithm. As semiconductor manufacturing has moved to EUV lithography to meet the next technology node, accurate photomask metrology with resolution in the nanometer range is crucial for high production yield. To find the optimal reconstruction strategy to achieve the highest resolution, sensitivity and reconstruction speed in RESCAN, we compared three algorithms. We demonstrate that, for the current setup, the best approach is the difference map algorithm.

Conference Presentation

Citation Download Citation

Ricarda Nebling, Iacopo Mochi, Dimitrios Kazazis, Uldis Locans, Atoosa Dejkameh, and Yasin Ekinci "EUV reticle inspection using phase retrieval algorithms: a performance comparison", Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 111470R (29 September 2019); https://doi.org/10.1117/12.2536936

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