Influence of the dose assignment and fracturing type on patterns exposed by a variable shaped e-beam writer: simulation vs experiment

Varvara Brackmann; Michael Friedrich; Clyde Browning; Norbert Hanisch; Benjamin Uhlig

doi:10.1117/12.2534642

29 August 2019 Influence of the dose assignment and fracturing type on patterns exposed by a variable shaped e-beam writer: simulation vs experiment

Varvara Brackmann, Michael Friedrich, Clyde Browning, Norbert Hanisch, Benjamin Uhlig

Author Affiliations +

Proceedings Volume 11177, 35th European Mask and Lithography Conference (EMLC 2019); 1117713 (2019) https://doi.org/10.1117/12.2534642
Event: 35th European Mask and Lithography Conference, 2019, Dresden, Germany

Abstract

The result of electron beam lithography is influenced by many effects: forward and backward scattering, formation of secondary electrons, re-scattering of electrons, chemicals diffusion in the resist material, wafer stack, etc. To achieve high resolution all these effects should be taken into account. Commonly, the electron energy distribution in the exposed matter is described by the Point Spread Function (PSF). This is a simple approach which takes into account large portion of phenomena using few parameters. PSF function is a Gauss or multiple Gauss function, which is determined experimentally by the calibration procedure. Each resist material with corresponding stack is characterised by its own PSF, in case of double Gaussian, with the following parameters: α, β and η. In the current work the PSF parameters were systematically varied to study their influence on the dose assignment and resulting pattern. This gives a broader understanding of the correction mechanism using PSF. Furthermore, the resulting shape of the structure is influenced not only by the PSF parameters and dose assignment, but by the fracturing type as well. All these effects were studied using experimental and simulation approaches.

Citation Download Citation

Varvara Brackmann, Michael Friedrich, Clyde Browning, Norbert Hanisch, and Benjamin Uhlig "Influence of the dose assignment and fracturing type on patterns exposed by a variable shaped e-beam writer: simulation vs experiment", Proc. SPIE 11177, 35th European Mask and Lithography Conference (EMLC 2019), 1117713 (29 August 2019); https://doi.org/10.1117/12.2534642

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Point spread functions

Scattering

Scanning electron microscopy

Tolerancing

Critical dimension metrology

Calibration

Electron beam lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years