ArF*, KrF*, and FI lasers pumped by double discharge from generator with semiconductor opening switch

Alexei N. Panchenko; Victor F. Tarasenko

doi:10.1117/12.2548394

11 December 2019 ArF*, KrF*, and FI lasers pumped by double discharge from generator with semiconductor opening switch

Alexei N. Panchenko, Victor F. Tarasenko

Proceedings Volume 11322, XIV International Conference on Pulsed Lasers and Laser Applications; 113222S (2019) https://doi.org/10.1117/12.2548394
Event: XIV International Conference on Pulsed Lasers and Laser Applications (AMPL-2019), 2019, Tomsk, Russian Federation

Abstract

Discharge and laser parameters in high-pressure gas mixtures of rare gases with F₂ under pumping by generators with inductive energy storage (IES) and semiconductor opening switch (SOS) are studied. It was shown that the pre-pulse with high pumping power formed by IES produces high-density discharge plasma and inversion population in gas mixtures under study within ∼10 ns and provides both early one-set of lasing and conditions for efficient excitation of an active medium from the storage capacitor. The high-voltage pre-pulse from the IES and sharp increase of discharge current allows to form long-lived stable volume discharge. Improve of pulse duration and (or) output energy was achieved for atomic fluorine, ArF* and KrF* excimer lasers.

Citation Download Citation

Alexei N. Panchenko and Victor F. Tarasenko "ArF*, KrF*, and FI lasers pumped by double discharge from generator with semiconductor opening switch", Proc. SPIE 11322, XIV International Conference on Pulsed Lasers and Laser Applications, 113222S (11 December 2019); https://doi.org/10.1117/12.2548394

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