Presentation + Paper
21 August 2020 Design of ultrashort Kirkpatrick-Baez mirror for soft x-ray nanofocusing
Takenori Shimamura, Yoko Takeo, Takashi Kimura, Hirokazu Hashizume, Yasunori Senba, Hikaru Kishimoto, Haruhiko Ohashi, Hidekazu Mimura
Author Affiliations +
Abstract
X-ray focusing optics are essential for acquiring high-quality X-ray microscopy images. Fresnel zone plates (FZPs) are conventionally used to focus soft X-rays via diffraction. The use of Kirkpatrick-Baez (KB) mirrors for nanofocusing in the soft X-ray region is limited because a KB mirror is a reflective X-ray focusing optic that has a pair of perpendicular mirrors in a grazing-incidence configuration, which lowers the numerical aperture due to the long focal length. KB mirrors with a short focal length have been proposed for hard X-ray focusing. This paper presents the design of an ultrashort KB mirror for soft X-ray focusing that has an extremely short focal length, which is achieved by reducing its mirror length. Moreover, a large grazing angle is employed to utilize total-reflection-based focusing. An ultrashort KB mirror is proposed for pilot studies at beamline BL25SU-A, SPring-8, Japan. A ray-tracing simulator is used to determine the misalignment tolerance in terms of roll and yaw for each mirror in the KB geometry. Based on the results, a mirror manipulator and other equipment are designed to precisely position the mirrors. Although this strategy, commonly used for FZPs, leads to a short working distance and a small beam acceptance, we believe that it can be applied to ultrashort KB mirrors for X-ray microscopy applications with achromaticity and strong demagnification.
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takenori Shimamura, Yoko Takeo, Takashi Kimura, Hirokazu Hashizume, Yasunori Senba, Hikaru Kishimoto, Haruhiko Ohashi, and Hidekazu Mimura "Design of ultrashort Kirkpatrick-Baez mirror for soft x-ray nanofocusing", Proc. SPIE 11492, Advances in Metrology for X-Ray and EUV Optics IX, 114920P (21 August 2020); https://doi.org/10.1117/12.2569845
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KEYWORDS
Mirrors

X-rays

Reflectivity

X-ray optics

X-ray diffraction

Diffraction

X-ray microscopy

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