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18 September 2020 Investigation of excitation dynamics in HfO2 and SiO2 monolayers using subpicosecond pump-and-probe damage testing (Withdrawal Notice)
Kyle R. P. Kafka, Brittany N. Hoffman, Alexei A. Kozlov, Stavros G. Demos
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Proceedings Volume 11514, Laser-induced Damage in Optical Materials 2020; 1151411 (2020) https://doi.org/10.1117/12.2571240
Event: SPIE Laser Damage, 2020, Online Only
Abstract
This presentation, originally published on 11 September 2020, was withdrawn per author request.
Kafka, Hoffman, Kozlov, and Demos: Investigation of excitation dynamics in HfO2 and SiO2 monolayers using subpicosecond pump-and-probe damage testing (Withdrawal Notice)
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Kyle R. P. Kafka, Brittany N. Hoffman, Alexei A. Kozlov, and Stavros G. Demos "Investigation of excitation dynamics in HfO2 and SiO2 monolayers using subpicosecond pump-and-probe damage testing (Withdrawal Notice)", Proc. SPIE 11514, Laser-induced Damage in Optical Materials 2020, 1151411 (18 September 2020); https://doi.org/10.1117/12.2571240
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KEYWORDS
Silica
Picosecond phenomena
Pulsed laser operation
Laser ablation
Laser damage threshold
Electrons
Laser energy
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