Poster + Presentation + Paper
22 February 2021 In-line applications of atomic force microscope based topography inspection for emerging roll-to-roll nanomanufacturing processes
Liam G. Connolly, Michael Cullinan
Author Affiliations +
Conference Poster
Abstract
This paper seeks to demonstrate the efficacy of a new approach for fast, in-line, and direct topography measurement of nano-scale structures and features on a flexible substrate, or web, in a roll-to-roll fashion. Nanofeatured products manufactured with R2R processes can be extremely cost competitive compared to more traditional, wafer-based solutions in addition to their unique and desirable mechanical properties. As such they are an area of immense research interest. But, despite the promise of these products for a plethora of applications, the leap from lab-scale prototypes to pilot- or volumescale manufacturing has proven extraordinarily difficult and expensive — with both required research and development investment and achievable process yield proving sizable barriers. A key capability gap in current art and roadblock on the path towards more widespread research and adoption of these R2R fabricated products is the lack of high-throughput, nanometer-scale metrology for process development, control, and yield enhancement. In this work a new type of extremely compact, tip-based microscope designed and fabricated with a micro-electro-mechanical system approach is applied to the challenge of direct topography measurement for roll-to-roll fabricated nanopatterns. A proof-of-concept tool with subsystems to regulate the flexible web, isolate and position the atomic force microscope, and measure features on the substrate, all coordinated by a real-time embedded control system is shown and step-and-scan measurement results were acquired. However, to genuinely meet this extent need for roll-to-roll metrology, a system capable of atomic force microscope scanning despite a continuous, non-zero web velocity must be developed to meet throughput requirements without degrading measurement quality and thus help to enable the next generation of R2R nanomanufacturing technology.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Liam G. Connolly and Michael Cullinan "In-line applications of atomic force microscope based topography inspection for emerging roll-to-roll nanomanufacturing processes", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161136 (22 February 2021); https://doi.org/10.1117/12.2584346
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
Back to Top