Influence of mixed argon on synthesizing type IV silica glass

Yuancheng Sun; Xiurong Du; Xiaoqiang Zhang; Xuefu Song; Ning Hua

doi:10.1117/12.2585154

4 December 2020 Influence of mixed argon on synthesizing type IV silica glass

Yuancheng Sun, Xiurong Du, Xiaoqiang Zhang, Xuefu Song, Ning Hua

Proceedings Volume 11617, International Conference on Optoelectronic and Microelectronic Technology and Application; 116171F (2020) https://doi.org/10.1117/12.2585154
Event: International Conference on Optoelectronic and Microelectronic Technology and Application, 2020, Nanjing, China

Abstract

Silica glass synthesized by plasma chemical vapor deposition (PCVD) process is called water-free silica glass or type IV silica glass. It exhibits low optical absorption because of low content of hydroxyl and other impurities. So it is excellent optical material and indispensable in high power laser technology. The status of plasma dramatically influences deposition quality of type IV silica glass. The influence of ionization gas component on electron temperature was investigated by changing proportion of mixing argon into air. Status of plasma and morphology of the SiO₂ particles were studied.

Citation Download Citation

Yuancheng Sun, Xiurong Du, Xiaoqiang Zhang, Xuefu Song, and Ning Hua "Influence of mixed argon on synthesizing type IV silica glass", Proc. SPIE 11617, International Conference on Optoelectronic and Microelectronic Technology and Application, 116171F (4 December 2020); https://doi.org/10.1117/12.2585154

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