Excimer Laser Reflectors

Peifu Gu; Jinfa Tang

doi:10.1117/12.962924

25 January 1990 Excimer Laser Reflectors

Peifu Gu, Jinfa Tang

Proceedings Volume 1166, Polarization Considerations for Optical Systems II; (1990) https://doi.org/10.1117/12.962924
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

The development of low losses all - dielectric laser reflector is essential for powerful excimer lasers in UV and VUV. The excimer laser reflectors at wavelengths of 351nm( Xen , 308nm( XeC1) and 193nm ( ArF) consisted of Zr02 - Y203/Si0₂ and A1203/Si02 have been prepared. The reflectance in such reflectors reaches 99. 7% at wavelength of 351nm, 99. 5% at 308nm, and 98% at 193nm. And the laser in-duced damage threshold has been raised to around 8. 5J/cm2 at wavelength of 308nm.

Citation Download Citation

Peifu Gu and Jinfa Tang "Excimer Laser Reflectors", Proc. SPIE 1166, Polarization Considerations for Optical Systems II, (25 January 1990); https://doi.org/10.1117/12.962924

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