Presentation + Paper
5 March 2021 One-step fabrication of surface relief dot-matrix holograms using supramolecular azopolymer thin films
Author Affiliations +
Abstract
Supramolecular azopolymer thin films are a promising material for the one-step fabrication of optical microstructures. Here we report the application of these materials to the fabrication of micrograting surface arrays, also known as dotmatrix holograms. The films were fabricated using commercially available azobenzene and polymeric components and were spin-coated on glass. The gratings were photopatterned using two-beam interference at 488 nm with 2.5 mW optical power and exposure times under 10 s. The gratings appear immediately, require no post-exposure processing, and their amplitude can be precisely controlled via exposure time. This was exploited to create two-dimensional dot-matrix arrays by mapping gray-scale images to exposure time. Individual surface relief gratings were 50 μm in diameter, with a sinusoidal amplitude up to 600 nm. The dot spacing was controlled by mechanically translating the film between exposures, with resolutions up to 800 dpi possible. The dot matrix structures are stable in ambient conditions and can be replicated using nanoimprint lithography.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel Stolz, Jonas Strobelt, Max Leven, Luke Kurlandski, Heba Abourahma, and David J. McGee "One-step fabrication of surface relief dot-matrix holograms using supramolecular azopolymer thin films", Proc. SPIE 11710, Practical Holography XXXV: Displays, Materials, and Applications, 1171008 (5 March 2021); https://doi.org/10.1117/12.2582763
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KEYWORDS
Holograms

Thin films

Glasses

Laser sources

Modulation

Nanoimprint lithography

Photochemistry

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