Presentation
30 September 2021 0.33 NA EUV systems for high-volume manufacturing
Author Affiliations +
Abstract
ASML NXE:3400 scanners are now commonly used for High Volume Manufacturing (HVM) of 7nm and 5nm logic devices as well as D1z memory devices. This year, ASML has introduced the NXE:3600D scanner to the market, targeting 3nm logic and D1a and D1b nodes. In this paper we will share the latest performance of these systems, including excellent overlay, critical dimension (CD) control, stability, reliability, and high productivity. Furthermore, we will address the ASML roadmap for meeting the requirements for the 2 nm node and beyond.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christophe Smeets, Roderik Van Es, Roelof De Graaf, Leon Levasier, Marcel Mastenbroek, and Eric Verhoeven "0.33 NA EUV systems for high-volume manufacturing", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 1185404 (30 September 2021); https://doi.org/10.1117/12.2600961
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KEYWORDS
High volume manufacturing

Extreme ultraviolet

Scanners

Control systems

Critical dimension metrology

Logic

Logic devices

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