High NA EUV optics: preparing lithography for the next big step

Paul Graeupner; Peter Kuerz; Jan Van Schoot; Judon Stoeldraijer

doi:10.1117/12.2600962

28 September 2021 High NA EUV optics: preparing lithography for the next big step

Paul Graeupner, Peter Kuerz, Jan Van Schoot, Judon Stoeldraijer

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118540F (2021) https://doi.org/10.1117/12.2600962
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

To further increase the resolution of EUV scanners ZEISS is working on next generation EUV optics with an increased NA of 0.55. This next generation optics consists of a highly flexible illumination system and projection optics with NA 0.55 to allow scaling beyond the next decade. In this presentation we will present the status of the high-NA optics program at ZEISS. We report on the high NA infrastructure including mirror polishing, coating, surface figure metrology, mirror handling, and integration tooling. Progress in manufacturing of mechanics, frames and mirrors at ZEISS for both illuminator and POB will be shown.

Conference Presentation

Citation Download Citation

Paul Graeupner, Peter Kuerz, Jan Van Schoot, and Judon Stoeldraijer "High NA EUV optics: preparing lithography for the next big step", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118540F (28 September 2021); https://doi.org/10.1117/12.2600962

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