A Review of Metalorganic Chemical Vapor Deposition of High-Temperature

A. Erbil; K. Zhang; B. S. Kwak; E. P. Boyd

doi:10.1117/12.965153

19 March 1990 A Review of Metalorganic Chemical Vapor Deposition of High-Temperature Superconducting Thin Films

A. Erbil, K. Zhang, B. S. Kwak, E. P. Boyd

Proceedings Volume 1187, Processing of Films for High Tc Superconducting Electronics; (1990) https://doi.org/10.1117/12.965153
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States

Abstract

A status report is given on the metalorganic chemical vapor deposition (MOCVD) of high-temperature superconducting thin films. The advantages of MOCVD processing manifest themselves in the quality of the films produced, and in the economy of the process. Metalorganic precursor requirements, deposition parameters and film properties are discussed. Also difficulties have been identified in making MOCVD a manufacturing technology. To solve these problems, future research directions are proposed.

Citation Download Citation

A. Erbil, K. Zhang, B. S. Kwak, and E. P. Boyd "A Review of Metalorganic Chemical Vapor Deposition of High-Temperature Superconducting Thin Films", Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); https://doi.org/10.1117/12.965153

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