Paper
23 August 2021 High-brightness LDP source for EUVL mask inspection
Author Affiliations +
Abstract
The Laser-assisted discharge-produced (LDP) plasma EUV source was developed as a light source for actinic mask inspection and beamline application. Since the focused laser irradiation is used to ignite the discharge, the LDP plasma has a unique feature of high brightness and high power. It can be operated at the frequency of up to 10 kHz generating <200 W/mm2/sr in-band EUV brightness at plasma. The source reliability is also proven in the field as a source for actinic mask inspection. In the paper, the key performances of the LDP source will be discussed.
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuya Aoki, Yoshihiko Sato, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, and Hidenori Watanabe "High-brightness LDP source for EUVL mask inspection", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080I (23 August 2021); https://doi.org/10.1117/12.2601995
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet

Plasma

Tin

Inspection

Light sources

Extreme ultraviolet lithography

Photomasks

RELATED CONTENT

LPP light source for actinic HVM inspection applications
Proceedings of SPIE (March 19 2015)
High-radiance LDP source for mask-inspection application
Proceedings of SPIE (March 19 2015)
High-brightness LDP source for EUVL mask inspection
Proceedings of SPIE (September 15 2022)
High-brightness LDP source
Proceedings of SPIE (September 29 2023)
High-brightness LDP EUV source for EUV mask inspection
Proceedings of SPIE (January 01 1900)
High-brightness LPP source for actinic mask inspection
Proceedings of SPIE (March 29 2011)

Back to Top