Presentation
12 October 2021 Embedded contamination induced by etching in E-beam deposited silica: A possible precursor to laser damage
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Abstract
We investigate contamination induced in grating-like structures during the etching process as a possible precursor to laser-induced damage. Our experimental model utilizes 5-mm line structures fabricated in E-beam–deposited coatings of silica using reactive ion etching (RIE) and reactive ion beam etching (RIBE). This makes it possible to compare the behavior in the pillars and trench regions. The results suggest that surface contaminants are primarily fluorinated polymers, while embedded contaminants consist primarily of carbon with very low detection of fluorine. Samples fabricated by the RIBE method exhibit significantly reduced roughness in the trenches, yet still present similar embedded contamination.
Conference Presentation
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Russell Dent, Brittany N. Hoffman, Alexei A. Kozlov, Nan Liu, Amy L. Rigatti, Stavros G. Demos, and Alexander A. Shesopalov "Embedded contamination induced by etching in E-beam deposited silica: A possible precursor to laser damage", Proc. SPIE 11910, Laser-Induced Damage in Optical Materials 2021, 1191014 (12 October 2021); https://doi.org/10.1117/12.2597975
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KEYWORDS
Contamination

Reactive ion etching

Etching

Chemical analysis

Laser damage threshold

Optical fabrication

Polymers

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