Improving silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques

Youssef Drissi; Werner Gillijns; Sebastien Lardenois; Peter Verheyen; Guy Lepage; Mahmoud Mohsen; Maxence Delorme

doi:10.1117/12.2609092

5 March 2022 Improving silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques

Youssef Drissi, Werner Gillijns, Sebastien Lardenois, Peter Verheyen, Guy Lepage, Mahmoud Mohsen, Maxence Delorme

Author Affiliations +

Proceedings Volume 12012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV; 1201208 (2022) https://doi.org/10.1117/12.2609092
Event: SPIE OPTO, 2022, San Francisco, California, United States

Abstract

On a Silicon Photonics integrated circuit, information is carried by the light that propagates within silicon waveguides. The waveguide’s geometry determines the functionality. The curvilinearity of Silicon Photonics designs would raise challenges for the manufacturability. However, so far Silicon Photonics design dimensions are considered relaxed by the industry. Also, the type of shapes that are drawn would generally use rather simple geometry objects. This allows the usage of conventional techniques in the different phases of the manufacturability. Recently has emerged a type of Silicon Photonics design, referred to as “inverse design”. This new technique produces designs that are very exotic and quite unpredictable. It shows complex geometries which critical dimensions require innovative Resolution Enhancement Techniques at the different stages of the Optical Proximity Correction flow. The success of these “inverse designs” relies on a very accurate pattern fidelity. This presentation will demonstrate a flow going from modelling, to OPC and metrology and verification of the manufactured wafer data. This flow permits to tackle the challenges brought newly to the Silicon Photonics environment.

Conference Presentation

Citation Download Citation

Youssef Drissi, Werner Gillijns, Sebastien Lardenois, Peter Verheyen, Guy Lepage, Mahmoud Mohsen, and Maxence Delorme "Improving silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques", Proc. SPIE 12012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV, 1201208 (5 March 2022); https://doi.org/10.1117/12.2609092

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available