Interferometric ellipsometry for massive angular spectra to overcome sensitivity limitation in device metrology

Jaehwang Jung; Jinseob Kim; Jinyong Kim; Seungwoo Lee; Seoyeon Jeong; Inho Shin; Wookrae Kim; Changhoon Choi; Myungjun Lee

doi:10.1117/12.2607442

13 June 2022 Interferometric ellipsometry for massive angular spectra to overcome sensitivity limitation in device metrology

Jaehwang Jung, Jinseob Kim, Jinyong Kim, Seungwoo Lee, Seoyeon Jeong, Inho Shin, Wookrae Kim, Changhoon Choi, Myungjun Lee

Author Affiliations +

Proceedings Volume 12053, Metrology, Inspection, and Process Control XXXVI; 120530R (2022) https://doi.org/10.1117/12.2607442
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

We present advanced application of novel ellipsometry technique, referred to as self-interference pupil ellipsometry (SIPE), integrating self-interference and pupil microscopy to overcome the sensitivity limitations raised from the conventional spectroscopic ellipsometry. We investigated various samples including a SiO2 monolayer, grating patterned wafers, and DRAM wafers to demonstrate outstanding capability of SIPE for metrology. The angular range corresponds to approximately 5,000 acquisition of conventional ellipsometry tools with 2º angular step scanning. From the experimental results and simulation, we expect the sensitivity of SIPE for structure metrology is at least 0.15 nm at a single wavelength and even better for multispectral measurements.

Conference Presentation

Citation Download Citation

Jaehwang Jung, Jinseob Kim, Jinyong Kim, Seungwoo Lee, Seoyeon Jeong, Inho Shin, Wookrae Kim, Changhoon Choi, and Myungjun Lee "Interferometric ellipsometry for massive angular spectra to overcome sensitivity limitation in device metrology", Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 120530R (13 June 2022); https://doi.org/10.1117/12.2607442

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