Fabrication of none-opposite-deposited micro-structure on diamond with the SiO2/Cr bilayer mask

Zhiqi Yang; Xing Liu; Tsu-Chien Weng

doi:10.1117/12.2617989

15 February 2022 Fabrication of none-opposite-deposited micro-structure on diamond with the SiO₂/Cr bilayer mask

Zhiqi Yang, Xing Liu, Tsu-Chien Weng

Proceedings Volume 12166, Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021); 121667I (2022) https://doi.org/10.1117/12.2617989
Event: Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021), 2021, Hong Kong, Hong Kong

Abstract

Benefitting from the ultra-broad transparency window, high refractive index and exceptional thermal conductivity, diamond has attracted numerous spotlights on the optical applications and the academic researches. However, the practical deployments of high-quality diamond element were obstructed by the immature manufacture techniques. Here we designed a new mask system for diamond etching that utilizes SiO₂ as the main hard mask layer and Cr as the adhesive layer. The cross-section morphology revels three distinct characteristics including an upper slope, a middle vertical sidewall and a trench at the bottom because of the retreat of thick SiO₂ mask during the etching process. The completely different etching profile from the previous metal masks has the potential to realize higher aspect ratio etching than traditional metal masks for diamond elements.

Citation Download Citation

Zhiqi Yang, Xing Liu, and Tsu-Chien Weng "Fabrication of none-opposite-deposited micro-structure on diamond with the SiO₂/Cr bilayer mask", Proc. SPIE 12166, Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021), 121667I (15 February 2022); https://doi.org/10.1117/12.2617989

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