Research and optimization of stock removal uniformity in planetary double-sided polishing process

Xueliang Lv; Zijin Li; Qing Li; Kaiyu Li; Rui Liu; Jinhui Yang; You Zhou; Yang Zhang

doi:10.1117/12.2635197

25 April 2022 Research and optimization of stock removal uniformity in planetary double-sided polishing process

Xueliang Lv, Zijin Li, Qing Li, Kaiyu Li, Rui Liu, Jinhui Yang, You Zhou, Yang Zhang

Proceedings Volume 12244, 2nd International Conference on Mechanical, Electronics, and Electrical and Automation Control (METMS 2022); 122440E (2022) https://doi.org/10.1117/12.2635197
Event: 2nd International Conference on Mechanical, Electronics, and Electrical and Automation Control (METMS 2022), 2022, Guilin, China

Abstract

The stock removal uniformity in planetary double-sided polishing process has an important influence on the optical materials surface quality. The velocity equation is set up through the kinematical analysis of double-sided polishing process, which refers to any point of the workpieces relative to the pad, and then a quantitative evaluation method of stock removal uniformity is simulated, and finally the optimal parameters of stock removal uniformity are obtained. As the results shown, when the radius ratio between the sun gear and ring gear is equal or greater than 0.2, the parameters m and n fit the equation: n=2.33m-0.06, the optimal stock removal uniformity is obtained.

Citation Download Citation

Xueliang Lv, Zijin Li, Qing Li, Kaiyu Li, Rui Liu, Jinhui Yang, You Zhou, and Yang Zhang "Research and optimization of stock removal uniformity in planetary double-sided polishing process", Proc. SPIE 12244, 2nd International Conference on Mechanical, Electronics, and Electrical and Automation Control (METMS 2022), 122440E (25 April 2022); https://doi.org/10.1117/12.2635197

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