Simulation verification for the cause of overlapped interference fringes in homogeneity measurement of quartz substrate

Xianyu Wu; Sen Han; Xianhao Qi; Jun Cheng; Bo Zhang; Xuefeng Zeng; Xiao Luo

doi:10.1117/12.2643369

19 December 2022 Simulation verification for the cause of overlapped interference fringes in homogeneity measurement of quartz substrate

Xianyu Wu, Sen Han, Xianhao Qi, Jun Cheng, Bo Zhang, Xuefeng Zeng, Xiao Luo

Author Affiliations +

Proceedings Volume 12319, Optical Metrology and Inspection for Industrial Applications IX; 123191D (2022) https://doi.org/10.1117/12.2643369
Event: SPIE/COS Photonics Asia, 2022, Online Only

Conference Poster

Abstract

Photomask manufacturing is an essential cornerstone of the semiconductor industry. Photomask substrate made of quartz is a hot topic in photomask manufacturing today, and the high requirements of photomask on quartz substrate make its optical homogeneity index extremely important as well. When measuring the optical homogeneity of a quartz substrate using a four-step absolute measurement method based on the Fizeau phase shift interference principle, the phenomenon of overlapping interference fringes was discovered. The cause was analyzed and the structure of measurement was simulated by Zemax. The simulation results identify the non-parallelity of the front and rear surfaces of the quartz substrate as the main effect.

Citation Download Citation

Xianyu Wu, Sen Han, Xianhao Qi, Jun Cheng, Bo Zhang, Xuefeng Zeng, and Xiao Luo "Simulation verification for the cause of overlapped interference fringes in homogeneity measurement of quartz substrate", Proc. SPIE 12319, Optical Metrology and Inspection for Industrial Applications IX, 123191D (19 December 2022); https://doi.org/10.1117/12.2643369

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