High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

V. Soltwisch; S. Glabisch; A. Andrle; V. Philipsen; Q. Saadeh; S. Schröder; L. Lohr; R. Ciesielski; S. Brose

doi:10.1117/12.2640176

1 November 2022 High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

V. Soltwisch, S. Glabisch, A. Andrle, V. Philipsen, Q. Saadeh, S. Schröder, L. Lohr, R. Ciesielski, S. Brose

Author Affiliations +

Proceedings Volume 12472, 37th European Mask and Lithography Conference; 124720Q (2022) https://doi.org/10.1117/12.2640176
Event: 37th European Mask and Lithography Conference, 2022, Leuven, Belgium

Abstract

Any modeling of an interaction between photons and matter is based on the optical parameters. The determination of these parameters, also called optical constants or refractive indices, is an indispensable component for the development of new optical elements such as mirrors, gratings, or lithography photomasks. Especially in the extreme ultraviolet (EUV) spectral region, existing databases for the refractive indices of many materials and compositions are inadequate or are a mixture of experimentally measured and calculated values from atomic scattering factors. Synchrotron radiation is of course ideally suited to verify such material parameters due to the tuneability of photon energy. However, due to the large number of possible compounds and alloys, the development of EUV laboratory reflectometers is essential to keep pace with the development of materials science and allow for inline or on-site quality control. Additionally, optical constants are also essential for EUV metrology techniques that aim to achieve dimensional reconstruction of nanopatterned structures with sub-nm resolution. For this purpose, we studied a TaTeN grating created on an EUV Mo/Si multilayer mirror, to mimic a novel absorber EUV photomask. We present here a first reconstruction comparison of these structures, measured by EUV scatterometry at the electron storage ring BESSYII and with a laboratory setup of a spectrally-resolved EUV reflectometer developed at RWTH Aachen University. Both approaches differ in several aspects reaching from setup size to spectral quality (brilliance, bandwidth and coherence) as well as the measured and simulated data.

Citation Download Citation

V. Soltwisch, S. Glabisch, A. Andrle, V. Philipsen, Q. Saadeh, S. Schröder, L. Lohr, R. Ciesielski, and S. Brose "High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments", Proc. SPIE 12472, 37th European Mask and Lithography Conference, 124720Q (1 November 2022); https://doi.org/10.1117/12.2640176

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
12 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Extreme ultraviolet

Scatterometry

Diffraction

Reflectivity

Photomasks

X-rays

Reflectometry

Show All Keywords

Keywords/Phrases

Search In:

Publication Years