Micro-nanostructuring by optical lithography and nitridation of photo-patternable TiO2 sol-gel to obtain micro-nanostructured TiN

V. Vallejo-Otero; N. Crespo-Monteiro; E. Gamet; S. Reynaud; C. Donnet; Y. Jourlin

doi:10.1117/12.2647262

30 April 2023 Micro-nanostructuring by optical lithography and nitridation of photo-patternable TiO₂ sol-gel to obtain micro-nanostructured TiN

V. Vallejo-Otero, N. Crespo-Monteiro, E. Gamet, S. Reynaud, C. Donnet, Y. Jourlin

Author Affiliations +

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 1249819 (2023) https://doi.org/10.1117/12.2647262
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Titanium nitride (TiN) combines plasmonic properties in the visible and near infrared spectral region with good mechanical properties, high thermal and chemical stability making it a very promising alternative to noble metals for optical applications at high temperature or in extreme environments. The authors present a new easy and fast process for the elaboration of micro-nanostructured TiN layers. This process combines photo-patternable TiO2 sol-gel by optical lithography and a nitridation process, by rapid thermal annealing (RTA). During this presentation, the elaboration of sol-gel, its structuring by different optical lithography methods, as well as its nitridation by RTA are presented.

Conference Presentation

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V. Vallejo-Otero, N. Crespo-Monteiro, E. Gamet, S. Reynaud, C. Donnet, and Y. Jourlin "Micro-nanostructuring by optical lithography and nitridation of photo-patternable TiO₂ sol-gel to obtain micro-nanostructured TiN", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 1249819 (30 April 2023); https://doi.org/10.1117/12.2647262

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