Algorithm for optimizing stepper performance through image manipulation

Chris A. Mack

doi:10.1117/12.20195

1 June 1990 Algorithm for optimizing stepper performance through image manipulation

Chris A. Mack

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20195
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The advent offlexible steppers allowing variation in the numericalaperture partial coherence and possibly other optical parameters allows new opportunities for optimization. Thispaper wilidiscuss a methodforpicking the optimum numerical aperture and partial coherence for a given mask pattern and focus budget. An algorithm will beproposedforfinding the optimum values. This algorithm could be used as a controllerfor an intelligent stepper

Citation Download Citation

Chris A. Mack "Algorithm for optimizing stepper performance through image manipulation", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20195

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