Dry etching for high-resolution maskmaking

Serge V. Tedesco; Christophe Pierrat; Jean Michel Lamure; C. Sourd; Jean-Luc Martin; Jean Charles Guibert

doi:10.1117/12.20185

1 June 1990 Dry etching for high-resolution maskmaking

Serge V. Tedesco, Christophe Pierrat, Jean Michel Lamure, C. Sourd, Jean-Luc Martin, Jean Charles Guibert

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20185
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

New development on both positive and negative tone resist allows maskmaking technology to achieve sub half micron fea tures through dry etching process. This paper will demonstrate lOOnm to 200nm lines and spaces maskmaking capability using standard chromium photomask coa ted with single layer resist SAL6O1 from Shipley for negative tone image and PLASI4ASK from UCB Electronics using the PRIME process for positive tone image. Moreover using PRIME a full dry process from resist deve lopment to chromium etching is proposed. An optimized process point for chromium etching using both SAL6O1 and PLASMASK resists obtained by statiscal experimen tal design is proposed. I .

Citation Download Citation

Serge V. Tedesco, Christophe Pierrat, Jean Michel Lamure, C. Sourd, Jean-Luc Martin, and Jean Charles Guibert "Dry etching for high-resolution maskmaking", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20185

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available