Characterization of NiC multilayer coating stress for x-ray optic applications

Danielle N. Gurgew; Srikanth Panini Singam

doi:10.1117/12.2677403

5 October 2023 Characterization of NiC multilayer coating stress for x-ray optic applications

Danielle N. Gurgew, Srikanth Panini Singam

Author Affiliations +

Proceedings Volume 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI; 126790N (2023) https://doi.org/10.1117/12.2677403
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States

Abstract

NiC multilayers have been identified as a promising coating design for hard x-ray astrophysical imaging applications enabling bandpass extension beyond the Pt K-edge of approximately 78 keV. However, these coatings are difficult to deposit with low interfacial roughness below a bilayer thickness of about 35 Å. Utilizing a DC magnetron sputtering system, NiC multilayer of varying d-spacings are deposited on flat Si wafers and characterized using 8.048 keV x-ray reflectometry measurements. The residual coating stress is also measured using interferometry. We investigate how deposition parameters affect both the coating quality (i.e. surface/interfacial roughness, density, etc.) and the residual coating stress. From these experimental results conducted on flat substrates, we employ FEM and ray trace simulations to determine how NiC multilayer stress could impact the figure, and therefore performance, of full shell x-ray optics.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Danielle N. Gurgew and Srikanth Panini Singam "Characterization of NiC multilayer coating stress for x-ray optic applications", Proc. SPIE 12679, Optics for EUV, X-Ray, and Gamma-Ray Astronomy XI, 126790N (5 October 2023); https://doi.org/10.1117/12.2677403

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