Presentation + Paper
3 October 2023 Surface figure correction using differential deposition of WSi2
Ch. Morawe, P. Bras, S. Labouré, F. Perrin, A. Vivo
Author Affiliations +
Abstract
The surface figure of an x-ray mirror was improved by differential deposition of WSi2 layers. DC magnetron sputtering through beam-defining apertures was applied on moving substrates to generate thin films with arbitrary longitudinal thickness variations. The required velocity profiles were calculated using a deconvolution algorithm. Height errors were evaluated after each correction iteration using off-line visible light surface metrology. WSi2 was selected as a promising material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm long flat Si mirror the shape error was reduced to less than 0.2 nm RMS.
Conference Presentation
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Ch. Morawe, P. Bras, S. Labouré, F. Perrin, and A. Vivo "Surface figure correction using differential deposition of WSi2", Proc. SPIE 12694, Advances in X-Ray/EUV Optics and Components XVIII, 1269405 (3 October 2023); https://doi.org/10.1117/12.2676633
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KEYWORDS
Film thickness

Mirror surfaces

Mirrors

Coating stress

Metrology

Silicon

X-rays

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