Development of a magnetron sputtering system for soft x-ray mirrors

S. Yokomae; T. Kume; Y. Matsuzawa; K. Hiraguri; H. Mimura; H. Hashizume

doi:10.1117/12.2678878

3 October 2023 Development of a magnetron sputtering system for soft x-ray mirrors

S. Yokomae, T. Kume, Y. Matsuzawa, K. Hiraguri, H. Mimura, H. Hashizume

Proceedings Volume 12694, Advances in X-Ray/EUV Optics and Components XVIII; 1269406 (2023) https://doi.org/10.1117/12.2678878
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States

Abstract

We developed a single-reflective-layer deposition system for the in-house production of x-ray mirrors. The system is based on magnetron sputtering and the linear motion of the substrate. Substrates with lengths up to 500 mm and widths up to 50 mm are processable. In this study, the deposition conditions of Au as a single reflective layer were investigated, assuming an application to a soft x-ray focusing mirror. Under various operating conditions, a 5-nm-thick Cr binder layer was deposited on a (100) Si wafer, followed by a 50-nm-thick Au film, and the surface roughness was evaluated by an atomic force microscope. The surface roughness of the Au film deposited using this system was in the range of 0.5–0.6 nm with no clear dependence on power (50–150 W), base pressure (3.4–5.0 × 10⁻⁵ Pa), and Ar flow rate (40–200 sccm).

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

S. Yokomae, T. Kume, Y. Matsuzawa, K. Hiraguri, H. Mimura, and H. Hashizume "Development of a magnetron sputtering system for soft x-ray mirrors", Proc. SPIE 12694, Advances in X-Ray/EUV Optics and Components XVIII, 1269406 (3 October 2023); https://doi.org/10.1117/12.2678878

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