Development of deposition system for the inner surface of Wolter mirror for x-ray telescopes

Shutaro Mohri; Akinari Ito; Shunsuke Ito; Gota Yamaguchi; Hidekazu Mimura

doi:10.1117/12.2676238

3 October 2023 Development of deposition system for the inner surface of Wolter mirror for x-ray telescopes

Shutaro Mohri, Akinari Ito, Shunsuke Ito, Gota Yamaguchi, Hidekazu Mimura

Proceedings Volume 12694, Advances in X-Ray/EUV Optics and Components XVIII; 1269407 (2023) https://doi.org/10.1117/12.2676238
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States

Abstract

Large Wolter mirrors fabricated by high-precision Ni electroforming process have been used for x-ray telescopes. Since the replication accuracy of these mirrors is on the order of 100 nm, the surface figure correction is necessary for improving the figure accuracy. Recently, we have proposed a new figure correction scheme utilizing a Si layer on the mirror surface. The thickness of Si film can be measured with accuracy at a 1 nm level by a thickness measurement gauge, and Si removal process will be applied so that the figure error is reduced. In this study, we developed the DC magnetron sputtering system especially for depositing a Si on the inner surface of the Wolter mirror. By optimizing the parameters such as Ar gas pressure and the sputter power, we demonstrated a coating of uniform Si layer on the Wolter mirror. The uniform Si layer with a thickness of 90 nm was successfully produced with an accuracy of ±10 nm in PV(Peak-to-Valley). The uniformity of the deposition using this method was 10 nm of PV(Peak-to-Valley).

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Shutaro Mohri, Akinari Ito, Shunsuke Ito, Gota Yamaguchi, and Hidekazu Mimura "Development of deposition system for the inner surface of Wolter mirror for x-ray telescopes", Proc. SPIE 12694, Advances in X-Ray/EUV Optics and Components XVIII, 1269407 (3 October 2023); https://doi.org/10.1117/12.2676238

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