Opportunities of polarization-resolved EUV scatterometry on photomasks

Victor Soltwisch; Till Biskup; Michael Kolbe; Frank Scholze

doi:10.1117/12.2675921

5 October 2023 Opportunities of polarization-resolved EUV scatterometry on photomasks

Victor Soltwisch, Till Biskup, Michael Kolbe, Frank Scholze

Proceedings Volume 12802, 38th European Mask and Lithography Conference (EMLC 2023); 128020G (2023) https://doi.org/10.1117/12.2675921
Event: 38th European Mask and Lithography Conference, 2023, Dresden, Germany

Abstract

The development of EUV scatterometry, as a potentially interesting option for the characterization of photomasks, has made significant progress in the last decade. The at-wavelength performance is directly assessed, and the measurements are potentially fast, a relevant precondition for the development of production-worthy instruments. However, an accurate prediction of the imaging properties requires a high effort in simulation and the precise determination of fundamental parameters such as the optical constants to correctly model the interaction of the EUV radiation with the nano-structured EUV mask. Another possibility to further increase the sensitivity and minimize the uncertainties in the reconstruction could be a polarization-resolved analysis of the scattered EUV radiation. The high degree of linear polarization of the beamline is ideal for investigating this question. However, it remains to be proven whether the additional measurement effort leads to a reduction of the uncertainties in the geometric reconstruction of the nanostructures. Besides theoretical modeling addressing this question, we also present benchmark measurements performed by PTB at the soft X-ray beamline of BESSY II.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Victor Soltwisch, Till Biskup, Michael Kolbe, and Frank Scholze "Opportunities of polarization-resolved EUV scatterometry on photomasks", Proc. SPIE 12802, 38th European Mask and Lithography Conference (EMLC 2023), 128020G (5 October 2023); https://doi.org/10.1117/12.2675921

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Extreme ultraviolet

Scatterometry

Diffraction

Photomasks

X-rays

Polarization

Modeling

Show All Keywords

Keywords/Phrases

Search In:

Publication Years