Presentation + Paper
12 March 2024 Ultraviolet beam pattern control in second and third harmonic generation by spatial wavefront modulation of near-infrared driving wavelength
Author Affiliations +
Abstract
The ultraviolet (UV) wavelengths are gaining attention in various applications including lithography, imaging, and spectroscopy due to their high photon energy and high spatial resolution. However, the strong UV absorption has required specialized optics for beam shaping and wavefront manipulation of the UV. In this paper, a novel beam shaping of UV is demonstrated by manipulating the wavefront of a near-infrared (NIR, λ=800 nm) driving laser in harmonic generation. The preservation of spatiotemporal coherence in harmonic generation allows the transfer of the spatial beam distribution from the IR driver to the UV harmonics. To separate the UV beam from the strong NIR background, a non-collinear harmonic generation configuration is employed. By using quartz and MgO nonlinear medium, the pattern of 2nd harmonic UV (λ=400 nm) and 3rd harmonic deep-UV (λ=266 nm) waves were manipulated. Our technique allows the wavefront control of UV laser beams in UV optical metrology and patterning.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seungjai Won, Taewon Kim, Seungman Choi, Byunggi Kim, Seung-Woo Kim, Joohyung Lee, and Young-Jin Kim "Ultraviolet beam pattern control in second and third harmonic generation by spatial wavefront modulation of near-infrared driving wavelength", Proc. SPIE 12869, Nonlinear Frequency Generation and Conversion: Materials and Devices XXIII, 128690L (12 March 2024); https://doi.org/10.1117/12.3000457
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KEYWORDS
Ultraviolet radiation

Spatial light modulators

Wavefronts

Harmonic generation

Deep ultraviolet

Third harmonic generation

Second harmonic generation

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