Higher diffraction orders and manufacturing defects in large metalenses

Matthew Ferguson; Ekaterina Poutrina; Joel Leger; Piyush Shah; Robert Bedford; Augustine Urbas; Jannick P. Rolland

doi:10.1117/12.3001582

13 March 2024 Higher diffraction orders and manufacturing defects in large metalenses

Matthew Ferguson, Ekaterina Poutrina, Joel Leger, Piyush Shah, Robert Bedford, Augustine Urbas, Jannick P. Rolland

Proceedings Volume 12897, High Contrast Metastructures XIII; 128970E (2024) https://doi.org/10.1117/12.3001582
Event: SPIE OPTO, 2024, San Francisco, California, United States

Abstract

Metasurfaces offer flexibility for expanding functionality and reducing the size of optical systems by providing optical functionality from a flat surface. Previous work has demonstrated a rapid fabrication and testing process for wafers containing multiple 1-centimeter diameter metalenses that can be applied towards mass manufacturing. However, quality feedback was limited to analyzing imaging performance parameters such as the modulation transfer function and focal length. These techniques do not give direct feedback about specific manufacturing errors. Currently, getting this feedback still requires expensive, time-intensive processes such as scanning electron microscope (SEM) measurements or local area interferometry, which tend to have a small field of view. Theoretical investigation suggests that phase errors in the metasurface phase profile result in a shift in diffraction efficiency away from the first order and into the other diffraction orders, zero order, second, third, etc. We exploit this concept to comprehensively characterize metalens performance, including the analysis of standard image quality parameters and extending the study to multiple diffraction orders. An extensive set of measurements of the relative efficiency of the diffraction orders is presented for a set of fabricated metalenses alongside SEM measurements to cross-validate the presence of manufacturing defects. This will establish the extent to which current conventional CMOS processing and manufacturing techniques can be applied to metasurface optics by indicating uniformity and yield characteristics across positions and wafers.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Matthew Ferguson, Ekaterina Poutrina, Joel Leger, Piyush Shah, Robert Bedford, Augustine Urbas, and Jannick P. Rolland "Higher diffraction orders and manufacturing defects in large metalenses", Proc. SPIE 12897, High Contrast Metastructures XIII, 128970E (13 March 2024); https://doi.org/10.1117/12.3001582

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