Poster
10 April 2024 Validation of high-throughput AFM for copper pad metrology in high volume manufacturing
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Conference Poster
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Kyung Souk Yi, Min Hong, Jiyeon Kim, Eunpa Kim, Kwang Soo Kim, Kyong Wook Noh, Su-Young Lee, Myungjun Lee, Yusin Yang, Hokyun Chin, Arseniy Kalinin, Irene Battisti, Erik Simons, Seokhan Kim, ShihWei Yu, Nelda Antonovaité, Niranjan Saikumar, Rudolf Wilhelm, and Hamed Sadeghian "Validation of high-throughput AFM for copper pad metrology in high volume manufacturing", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129552U (10 April 2024); https://doi.org/10.1117/12.3010488
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KEYWORDS
Atomic force microscopy

High volume manufacturing

Semiconducting wafers

Metrology

Copper

Chemical mechanical planarization

Miniaturization

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