Enhancing SEM image metrology with SMILE: advances, features, and portability

Iacopo Mochi

doi:10.1117/12.3010966

9 April 2024 Enhancing SEM image metrology with SMILE: advances, features, and portability

Iacopo Mochi

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129553C (2024) https://doi.org/10.1117/12.3010966
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

SMILE is a free software for the analysis of line/space and contact/hole pattern images. The software is specifically designed to investigate SEM images of test structures for photoresist screening and to extract relevant metrics to assess the quality of the patterns. These metrics include the average critical dimension, the unbiased line edge roughness and the eventual presence of defects. This paper reviews the latest functionalities of SMILE, discusses the plans for future upgrades and includes a step by step workflow guide to use the software.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Iacopo Mochi "Enhancing SEM image metrology with SMILE: advances, features, and portability", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129553C (9 April 2024); https://doi.org/10.1117/12.3010966

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