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18 June 2024 Deposition of thin films on hybrid-polymer 3D micro-optics using atomic layer deposition
D. Astrauskyte, K. Galvanauskas, D. Gailevičius, M. Drazdys, M. Malinauskas, L. Grineviciute
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Proceedings Volume 13020, Advances in Optical Thin Films VIII; 1302002 (2024) https://doi.org/10.1117/12.3017633
Event: SPIE Optical Systems Design, 2024, Strasbourg, France
Abstract
Anti-reflective (AR) coatings are widely utilized to minimize reflections from optical components. Laser direct writing (LDW) is employed to fabricate complex and multi-level micro-optical elements, such as micro-triplets. Conventional physical vapor deposition methods are insufficient to produce conformal coatings on complex shape and stacked substrates. The atomic layer deposition (ALD) technique offers a promising solution for achieving conformal coatings on free-form components. In this work, we demonstrate the deposition of an AR coating by ALD on LDW-fabricated microstructures and micro-lenses. The ALD-deposited AR coating successfully reduced reflection from 3.3% to 0.1% at 633 nm for one surface of SZ2080.
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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
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D. Astrauskyte, K. Galvanauskas, D. Gailevičius, M. Drazdys, M. Malinauskas, and L. Grineviciute "Deposition of thin films on hybrid-polymer 3D micro-optics using atomic layer deposition", Proc. SPIE 13020, Advances in Optical Thin Films VIII, 1302002 (18 June 2024); https://doi.org/10.1117/12.3017633
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KEYWORDS
Atomic layer deposition
Micro optics
Thin films
Thin film deposition
Antireflective coatings
Nanolithography
Optical coatings
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