Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging

Parul Dhagat; Sofia Leitao; Nadia Daniela Rivera Torres; Guido Schiffelers; David Rio; Cyrus Tabery

doi:10.1117/12.3035360

21 November 2024 Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging

Parul Dhagat, Sofia Leitao, Nadia Daniela Rivera Torres, Guido Schiffelers, David Rio, Cyrus Tabery

Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 1321506 (2024) https://doi.org/10.1117/12.3035360
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

“Low-n” bright field masks are key to enabling single exposure in 0.55NA at lower dose and improved contrast. However, these masks come with best focus shifts (BFS) for isolated features and an increased risk of assist feature (AF) printing. In this paper we describe how segmentation of AFs can minimize their printing risk without violating mask manufacturing limits for simple line spaces. They can also be used to address BFS and increase the depth of focus. The trade-off between AF print margin and the DOF performance is also considered. Finally, the impact of assist feature in reducing sensitivity to process variations is demonstrated on a logic clip.

Conference Presentation

Citation Download Citation

Parul Dhagat, Sofia Leitao, Nadia Daniela Rivera Torres, Guido Schiffelers, David Rio, and Cyrus Tabery "Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 1321506 (21 November 2024); https://doi.org/10.1117/12.3035360

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