Durable fluoride nanocomposite coatings for photolithography

Yingfu Li; Xinshang Niu; Hongfei Jiao; Jinlong Zhang; Xinbin Cheng; Zhanshan Wang

doi:10.1117/12.3040019

16 August 2024 Durable fluoride nanocomposite coatings for photolithography

Yingfu Li, Xinshang Niu, Hongfei Jiao, Jinlong Zhang, Xinbin Cheng, Zhanshan Wang

Author Affiliations +

Proceedings Volume 13231, 4th International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2024); 132310E (2024) https://doi.org/10.1117/12.3040019
Event: Fourth International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2024), 2024, Chongqing, China

Abstract

One of the reasons why the current optics used in 193 nm lithography do not have sufficiently high reflectivity and have poor optical timing is the lack of a low-refractive-index material with low absorption, low scattering, low residual stress, amorphous structure, and good aging resistance. In this study, we investigated the effect of the AlF3 content in MgF2-based low-refractive-index materials on the microstructure and optical properties of Mg1-xAlxF nanocomposite coatings prepared by thermal evaporation. Based on these findings, this study successfully solved the problems of large absorption, easy crystallization tendency, and poor aging performance of thermally evaporated AlF3 films. A novel low-refractive-index nanocomposite material with improved absorption reduction, scattering suppression, and aging resistance was obtained, which can be applied to the study of reflective optics for 193 nm lithography.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Yingfu Li, Xinshang Niu, Hongfei Jiao, Jinlong Zhang, Xinbin Cheng, and Zhanshan Wang "Durable fluoride nanocomposite coatings for photolithography", Proc. SPIE 13231, 4th International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2024), 132310E (16 August 2024); https://doi.org/10.1117/12.3040019

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