Physical aging of resists: the continual evolution of lithographic material

Patrick Jean Paniez; Andre P. Weill; Stephane D. Cohendoz

doi:10.1117/12.46382

1 June 1991 Physical aging of resists: the continual evolution of lithographic material

Patrick Jean Paniez, Andre P. Weill, Stephane D. Cohendoz

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46382
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Because polymers are not in a thermodynamic equilibrium for temperatures below Tg, such as room temperature, they gradually approach equilibrium through free volume relaxation. This phenomenon, called physical aging, implies that the lithographic material is slowly, but continually changing. These modifications can be observed using various techniques: Thermal Analysis, Ellipsometry, IRFT Spectrometry. The influence of physical aging on dissolution rate is clearly demonstrated. The results presented in this paper demonstrate that not only the chemical, but also the physical properties of polymers play an important role in lithographic processes.

Citation Download Citation

Patrick Jean Paniez, Andre P. Weill, and Stephane D. Cohendoz "Physical aging of resists: the continual evolution of lithographic material", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46382

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