Differential equation method for design of multimirror x-ray projection lithography systems

Cheng Wang; David L. Shealy

doi:10.1117/12.51274

1 January 1992 Differential equation method for design of multimirror x-ray projection lithography systems

Cheng Wang, David L. Shealy

Proceedings Volume 1547, Multilayer Optics for Advanced X-Ray Applications; (1992) https://doi.org/10.1117/12.51274
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

Based on Korsch's method for design of high performance telescopes, a differential equation design method (DEDM) for soft x-ray projection lithography has been developed. This method enables one to solve numerically for the shapes of two mirrors in a system such that the entire system rigorously satisfies the conditions of aplanatism. The shape of the other mirror(s) in the system are adjusted to minimize the residual aberrations. Three-mirror and four-mirror projection systems have been designed by using DEDM. Analysis of results is presented.

Citation Download Citation

Cheng Wang and David L. Shealy "Differential equation method for design of multimirror x-ray projection lithography systems", Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); https://doi.org/10.1117/12.51274

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