Experiences with thin-film filter development for the extreme ultraviolet explorer

John V. Vallerga; Peter W. Vedder; Oswald H. W. Siegmund

doi:10.1117/12.140573

21 January 1993 Experiences with thin-film filter development for the extreme ultraviolet explorer

John V. Vallerga, Peter W. Vedder, Oswald H. W. Siegmund

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140573
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

The design, development, and optimization of the thin film filters used on the Extreme Ultraviolet Explorer (EUVE) Satellite to define the EUV wavelength bandpasses of the individual instruments was a complicated task. The bandpasses had to be optimized for the astrophysical goals of the EUVE mission and constrained by the strong geocoronal EUV background emission. Materials with optical constants that met these requirements had to be found and tested. In many cases these materials were not compatible or were not strong enough to survive the intense vibrations of a rocket launch. Other effects, such as photoelectron 'halo' produced in the filters, were not discovered until flight qualification. The final set of flight filters included: lexan/boron, aluminum/carbon, titanium/antimony/aluminum, and tin/silicon monoxide. This paper discusses the lessons learned in the development of these filters, including the optimization process, material interactions and problems, calibration techniques, vibration susceptibility, thermal tests, and photoelectron emission. We feel the experiences gained over the last 10 years creating the filter sets for EUVE will be invaluable for future missions that use thin film filters.

Citation Download Citation

John V. Vallerga, Peter W. Vedder, and Oswald H. W. Siegmund "Experiences with thin-film filter development for the extreme ultraviolet explorer", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140573

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